Atomic Layer Deposition (ALD) is an emerging gas-phase deposition process that offers several advantages over conventional deposition methods. However, despite its benefits, reports on its application in membrane modification are minimal.

This book focuses on the use of ALD as a membrane modification approach for improved separation applications across various fields. It starts with an introduction to membrane science and ALD chemistry, followed by a detailed examination of the application of ALD in modifying polymeric, ceramic, and hybrid membranes. The text covers applications in reverse osmosis, nanofiltration, ultrafiltration, membrane distillation, and various gas separation technologies, including CO capture, hydrogen purification, and hydrocarbon separations.

This book integrates fundamental concepts, recent research, and practical knowledge in the field of membrane technology and is a useful resource for industrialists, researchers, and advanced graduate students working or entering the field.

Provides an accessible overview of the basics of Atomic Layer Deposition (ALD) and membrane science Examines the potential of ALD to improve membrane separation performance for water treatment and gas separation uses Compares ALD with other surface modification techniques and evaluates environmental and economic factors

Autorentext

Dr. Ngozi Enemuo is an environmental researcher specializing in sustainable membrane modification to improve separation performance in water and wastewater treatment. She has extensively worked on various membrane modifications to enhance their features and performance in water treatment. Her work has been published in high-impact, peer-reviewed international journals and has attracted a significant audience, as indicated by the increasing citations of her published works.

Dr. Ngozi is currently a postdoctoral researcher focused on integrating Atomic Layer Deposition (ALD) into membrane modification, offering a simpler method to modify membranes and achieve improved features and performance.

Dr. Kingsley Ukoba is a lecturer and researcher in the department of mechanical engineering science of the University of Johannesburg, South Africa. He obtained a doctoral degree in Mechanical Engineering from the University of KwaZulu-Natal, Durban in South Africa. He has authored book, book chapters and journal articles, presented in conferences and serves as a reviewer for high impact journals and conferences. He acts as an academic and career mentor to students.

Prof. Tien-Chien Jen joined the University of Johannesburg in 2015, before that he was a faculty member at the University of Wisconsin, Milwaukee. Prof. Jen received his Ph.D. in Mechanical and Aerospace Engineering from UCLA. He has received several competitive grants for his research, including those from the US National Science Foundation, the US Department of Energy, and the EPA in the USA. He is a fellow of American Society of Mechanical Engineers (ASME) and a member of Academy of Science of South Africa (ASSAf), among others.

Prof. Jen is a highly published and top-rated researcher. In addition to journal papers, he has published several books, and book chapters.

Inhalt

Chapter 1: Overview of membrane technology in water treatment and gas separation.- Chapter 2: Principles of Atomic Layer Deposition (ALD) techniques.- Chapter 3: Interface of ALD and membrane technology.- Chapter 4: ALD-based membrane modification for enhancing membrane performance.- Chapter 5: Membrane interface and morphology engineering via ALD.- Chapter 6: Improved membrane permeability, selectivity, and stability via ALD.- Chapter 7: Membrane Anti-Fouling ALD Surface Coatings.- Chapter 8: ALD in Photocatalytic and Self-Cleaning Membranes.- Chapter 9: Scale-Up, Process Integration, and Commercialization.- Chapter 10: Challenges, Future Directions, and Emerging Trends.