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Advanced Technologies Based on Wave and Beam Generated Plasmas

  • Kartonierter Einband
  • 588 Seiten
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Proceedings of the NATO Advanced Study Institute, Sozopol. Bulgaria, May 22-June 1, 1998This book draws together three areas of wo... Weiterlesen
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Beschreibung

Proceedings of the NATO Advanced Study Institute, Sozopol. Bulgaria, May 22-June 1, 1998

This book draws together three areas of work on plasma technologies: advanced efforts based on wave generated, high frequency plasmas, plasma assisted ion implantation, and electron beam generated plasma. It lays a foundation for the application of sources in industry and various research areas

Inhalt

Preface.Part 1: Lectures. 1.1. Gas Discharges: Applications. Plasma Discharges for Materials Processing and Display Applications; M.A. Lieberman. The Development and Use of Surface - Wave Sustained Discharges for Applications; M. Moisan, et al. Electrodeless Gas Discharges for Lighting; G.G. Lister. Plasma Production above Multipolar Magnetic Field Structures: from D.C. Magnetrons to Distributed ECR; J. Pelletier, et al. ECR Plasmas for Thin-Film Deposition; R. Wilhelm. Deposition Properties and Applications of Carbon-Based Coatings; R. Wilhelm. Substrate Biasing during Plasma Processing: Interest, Methods and Limitations; J. Pelletier. Ion Energy Distributions; G.W.M. Kroesen, et al. Dusty Plasmas: Fundamental Aspects and Industrial Applications; G.W.M. Kroesen, et al. 1.2. Ion Implantation. Plasma Based Ion Implantation; W. Möller. 1.3. Wave Generated Plasmas. Waveguide Stationary and Nonstationary Discharges: Modelling and Experiments; D. Grozev, et al. Nonuniformity Aspects in Modelling and Noncollisional Heating of HF Discharges; H. Schlüter. Travelling Wave Discharges in Nitrogen: Modelling and Experiment; C.M. Ferreira, et al. Atmospheric Pressure Discharges: Travelling Wave Plasma Sources; Z. Zakrzewski, M. Moisan. Modelling of Atmospheric Pressure Microwave Sustained Discharges; Z. Zakrzewski, et al. Long Microwave Discharges; Z. Zakrzewski, M. Moisan. Waves in Bounded Magnetized Plasmas; S.T. Ivanov. 1.4. Beam Generated Plasmas. Electron Beam Generated Plasmas: Theory Experiments, Applications; M.V. Kuzelev. EBIT: An Electron Beam Source for the Production and Confinement of Highly Ionized Atoms; G. Fußmann, et al. Part 2: Posters. Author Index. Subject Index.

Produktinformationen

Titel: Advanced Technologies Based on Wave and Beam Generated Plasmas
Editor:
EAN: 9789048151912
ISBN: 9048151910
Format: Kartonierter Einband
Herausgeber: Springer Netherlands
Anzahl Seiten: 588
Gewicht: 879g
Größe: H235mm x B155mm x T31mm
Jahr: 2010
Auflage: Softcover reprint of the original 1st ed. 1999

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