In response to the demands of contemporary solid material analysis-greater powers of detection, speed, depth, and precision-glow devices are receiving increased attention by specialists. This volume covers fundamental plasma processes, laser-based methods, thin film analysis, and many other processes to provide the researcher with an extensive technical reference of these devices.

Inhalt

Introduction; R.K. Marcus. Fundamental Plasma Processes; R.K. Marcus, D. Fang. Atomic Absorption and Flourescence Spectroscopies; E.H. Piepmeier. Atomic Emission Spectrometry; J.A.C. Broekaert. Glow Discharge Mass Spectrometry; W.W. Harrison, F.L. King. Hollow Cathode Discharges; S. Caroli, O. Senofonte. Analysis of Nonconducting Sample Types; R.K. Marcus, et al. Thin Film Analysis; H. Hocquaux. Discharges withing Graphite Furnace Atomizers; J.M. Harnly, et al. LaserBased Methods; K.R. Hess. Laser-Based Diagnostics of Reactive Plasmas; T.A. Miller, B.L. Preppernau. Index.