This book explores structural and electronic properties of strained epitaxial layers and the thermodynamics and kinetics of layer growth, and describes such growth techniques as metalorganic vapor phase epitaxy, molecular beam epitaxy and liquid phase epitaxy.

Provides the essentials for a comprehensive graduate course on crystal growth of semiconductor heterostructures Covers thermodynamics and kinetics of layer growth and major growth techniques Contains many instructive illustrations and examples Supports learning with exercises after each chapter and solutions in the end of the book

Autorentext

Dr. rer. nat. Udo W. Pohl, professor of experimental physics, studied physics in Aachen and Berlin, Germany, and received his Ph.D. degree in 1988 from the Technical University of Berlin, where he is currently principal investigator in the Institute of Solid State Physics. He is a member of the German Physical Society, participated in international conference committees, and has given keynote addresses at international conferences. Since the early 1990ies he has given lectures on semiconductor physics and epitaxy. In 2009, he was appointed Adjunct Professor of Physics at Technical University of Berlin. He is series editor of Materials Sciences, has authored over 200 journal articles and conference papers, the books Epitaxy of Semiconductors and - together with Prof. Dr. Karl W. Böer - Semiconductor Physics, thirteen book contributions, and patents. His current research interests include physics and epitaxy of semiconductor nanostructures and devices.

Inhalt

Introduction.- Structural Properties of Heterostructures.- Electronic Properties of Heterostructures.- Thermodynamics of Epitaxial Layer-Growth.- Atomistic Aspects of Epitaxial Layer-Growth.- In situ Growth Monitoring.- Application of Surfactants.- Doping, Diffusion, and Contacts.- Methods of Epitaxy.- Special Growth Techniques.