Plasma deposition techniques are of major importance because they can be used to produce high-quality thin films for applications in device technology. This introduction to the subject contains sufficient details of the foundations of plasma science to be useful to newcomers to the field and, at the same time, ample information about specific techniques and new results, so that established researchers will also find it of interest.

Inhalt

1. The Plasma State.- 1.1 Characterization of Plasma.- 1.2 Classification of Plasma.- 2. Reactions in Plasmas.- 2.1 Collision Phenomena.- 2.2 Excitation and Ionization.- 2.3 Recombination.- 2.4 Ion-Molecule Reactions and Reactions Involving Negative Ions.- 2.5 Transport Phenomena.- 3. Generation of Cold Plasma.- 3.1 Electrical Breakdown and Starting Voltage.- 3.2 Glow Discharge.- 3.3 High-Frequency Discharge.- 3.4 Microwave Discharge.- 4. Plasma Diagnostics.- 4.1 Optical Spectroscopy.- 4.2 Probes.- 4.3 Particle Measurements.- 4.4 Others.- 5. Cold Plasma and Thin Film Formation.- 5.1 Interactions of Cold Plasma with Solid Surfaces.- 5.2 Application of Cold Plasma to Thin Film Deposition.- 6. Physical Vapor Deposition Under Plasma Conditions.- 6.1 Sputter Deposition.- 6.2 Ion Plating.- 7. Chemical Vapor Deposition Under Plasma Conditions.- 7.1 Plasma-Enhanced Chemical Vapor Deposition.- 7.2 Plasma Polymerization.- 7.3 Other Techniques.- 8. Surface Modification by Cold Plasma.- 8.1 Surface Treatment for Metals and Semiconductors.- 8.2 Modification of Polymer Surfaces.- References.- Further Reading.