This book introduces materials scientists and designers, physicists and chemists to the properties of materials that can be modified by ion irradiation or implantation. These techniques can help design new materials or test modified properties.

Materials science is the prime example of an interdisciplinary science. It - compasses the ?elds of physics, chemistry, material science, electrical en- neering, chemical engineering and other disciplines. Success has been o- standing. World-class accomplishments in materials have been recognized by NobelprizesinPhysicsandChemistryandgivenrisetoentirelynewtechno- gies. Materials science advances have underpinned the technology revolution that has driven societal changes for the last ?fty years. Obviouslytheendisnotinsight!Futuretechnology-basedproblemsd- inatethecurrentscene.Highonthelistarecontrolandconservationofenergy and environment, water purity and availability, and propagating the inf- mation revolution. All fall in the technology domain. In every case proposed solutions begin with new forms of materials, materials processing or new arti?cial material structures. Scientists seek new forms of photovoltaics with greater e?ciency and lower cost. Water purity may be solved through surface control, which promises new desalination processes at lower energy and lower cost. Revolutionary concepts to extend the information revolution reside in controlling the spin of electrons or enabling quantum states as in quantum computing. Ion-beam experts make substantial contributions to all of these burgeoning sciences.

Deals with materials modifications by ion irradiation Covers a wide range of applications: ion-beam modifications of semiconductors (the main application field), ion-induced amorphization, surface patterning and roughening, nanocluster formation, implementation into magnetic geological and biological materials, and nanocluster formation Both a reference work for researchers and a study text for graduate students Includes supplementary material: sn.pub/extras

Autorentext

Harry Bernas is Research Director at the French National Research Center (CNRS). He has held various positions related to interdisciplinary research in CNRS, and was founding coordinator of the European COST program on Plasma- and Ion- Surface Engineering. He has authored over 200 papers in international journals and holds several patents. His main research interests are the study and control of materials nonequilibrium properties in metallic and oxide glasses, metal hydrides, semiconductors and metals under irradiation. In recent years, he has concentrated on the control via ion irradiation of magnetic properties in metallic nanostructures, and on the beam-controlled synthesis and optical properties of semiconductor and metal nanoclusters in glasses. He can be reached at bernas@csnsm.in2p3.fr.

Inhalt
Fundamental Concepts of Ion-Beam Processing.- Precipitate and Microstructural Stability in Alloys Subjected to Sustained Irradiation.- Spontaneous Patterning of Surfaces by Low-Energy Ion Beams.- Ion-Beam-Induced Amorphization and Epitaxial Crystallization of Silicon.- Voids and Nanocavities in Silicon.- Damage Formation and Evolution in Ion-Implanted Crystalline Si.- Point Defect Kinetics and Extended-Defect Formation during Millisecond Processing of Ion-Implanted Silicon.- Magnetic Properties and Ion Beams: Why and How.- Structure and Properties of Nanoparticles Formed by Ion Implantation.- Metal Nanoclusters for Optical Properties.- Ion Beams in the Geological Sciences.- Ion-Beam Modification of Polymer Surfaces for Biological Applications.