This book provides a systematic description and analysis of laser heat-mode lithography, addressing the basic principles, lithography system, manipulation of feature size, grayscale lithography, resist thin films, and pattern transfer, while also presenting typical experimental results and applications. It introduces laser heat-mode lithography, where the resist thin films are essentially an opto-thermal response to the laser beam with changeable wavelength and are not sensitive to laser wavelength. Laser heat-mode lithography techniques greatly simplify production procedures because they require neither a particular light source nor a particular environment; further, there are no pre-baking and post-baking steps required for organic photoresists. The pattern feature size can be either larger or smaller than the laser spot by adjusting the writing strategy. The lithographic feature size can also be arbitrarily tuned from nanoscale to micrometer without changing the laser spot size.Lastly, the line edge roughness can be controlled at a very low value because the etching process is a process of breaking bonds among atoms. The book offers an invaluable reference guide for all advanced undergraduates, graduate students, researchers and engineers working in the fields of nanofabrication, lithography techniques and systems, phase change materials, etc.

Systematically describes laser heat-mode lithography, addressing the basic principles, lithography system, manipulation of feature size, grayscale lithography, resist thin films, and pattern transfer Presents the latest research results on laser heat-mode nanolithography and grayscale lithography Provides a sound method for arbitrarily tuning the lithographic feature size from nanoscale to micrometer without changing the laser spot size Provides a feasible technique for high-speed large-area micro/nano-fabrication of arbitrary pattern structures

Autorentext

Jingsong Wei received the Ph.D. degree in Chinese Academy of Sciences. He is currently a Professor with Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences. He has published more than 120 articles in professional journals including Applied Physics Letters, Optics Express, Optics Letters, etc. His research interests include miro/nanolithography, super-resolution optics, and optical instruments.

Inhalt

Current status of lithography.- Principles of laser heat-mode lithography and thermal diffusion.- Laser heat-mode maskless lithography system.- Manipulation of thermal diffusion channels.- Laser heat-mode nanolithography on phase-change thin films.- Direct laser heat-mode nanopatterning on metallo-organic compound thin films.- Laser heat-mode patterning of transparent thin films.- Laser heat-mode grayscale image lithography.- Patterns transfer processes and applications.