Erosion and Growth of Solids Stimulated by Atom and Ion Beams

The members of the organising Committee and their colleagues have, for many years been investigating the evol ution of the fas'cinating surface features which develop during sputtering erosion of solids. Such experimental, theoretical and computational studies have also been carried out in many international laboratories and, as well as much cow~onality and agreement, substantial disagreements were unresolved. In view of the increasing importance of such processes in technological applications such as microlitho graphic etching for the patterning of solid state devices and in fusion technology it was felt opportune to hold a meeting in this area. Furthermore the use of energetic atomic and ion fluxes is also becoming of increasing importance in assisting or modifying the growth of thin films in a number of important industrial processes and it was therefore rational to combine the, study of both erosional and growth processes in a single meeting. These proceedings include 16 invited review and 15 oral or poster presented contributions to the NATO Advanced Study Institute on the "Erosion and Growth of Solids Stimulated by Atom and Ion Beams". The review contributions span the range from the fundamental concepts of ballistic sputtering, and how this influences surface morphology evolution, through processes involving entrapment of incident species to mechanisms involved in'the use of chemically reactive ion species. Further reviews outline the influence of energetic irradiation upon surface growth by atomic deposition whilst others discuss technologkal applications of both areas of growth and erosion.

Klappentext

Proceedings of the NATO Advanced Study Institute on Erosion and Growth of Solids Stimulated by Atom and Ion Beams, Heraklion, Crete, Greece, September 16-27, 1985

Inhalt

1. Physical Sputtering of Elemental Metals and Semiconductors.- 2. Ion Implantation Mechanisms and Related Computational Issues.- 3. The Theory of the Preferential Sputtering of Alloys, Including the Role of Gibbsian Segregation.- 4. Theory of Surface Erosion and Growth.- 5. On the Composition of the Sputtered Flux from Metal Targets and their Compounds.- 6. Geometric Methods of Analysis.- 7. Surface Topographical Evolution: Computational Methods of Analysis.- 8. Preferential Sputtering of Tantalum Oxide: Reemission of Helium and Transient Effects in the Altered Layer.- 9. Experimental Studies of Morphology Development.- 10 Investigation of Microtopography Induced during Sputter Depth Profiling of Ni/Cr Multilayered Structures.- 11. Effects of Surface Impurities and Diffusion on Ion Bombardment-Induced Topography Formation.- 12. Ion Trapping and Cluster Growth.- 13. Bubbles, Blisters, and Exfoliation.- 14. Examples of Ion Bombardment Effects on Film Growth and Erosion Processes - Plasma and Beam Experiments.- 15. On the Modification of Metal/Ceramic Interfaces by Low Energy Ion/Atom Bombardment during Film Growth.- 16. Plasma Etching for Silicon Device Technology.- 17. Reactive Ion Etching of GaAs and Related III-V Compounds.- 18. Ion Beam Enhanced Deposition and Dynamic Ion Mixing for Surface Modification.- 19. Molecular Beam Epitaxy and Selective MBE Deposition of GaAs Device Structures.- 20. Applications of Ion Beams in Microlithography.- 21. In Situ Ion Beam Processing for Josephson Junction Fabrication.- 22. Effect of Ion Implantation on Subsequent Erosion and Wear Behavior of Solids.- 23. Problems, Prospects and Applications of Erosional/Depositional Phenomena.- 24. The Influence of Incidence Angle on Damage Production in In+ Ion Implanted Si.- 25. Striation Production by Grazing Ion Incidence on Si.- 26. Influence of Lattice Defects Produced by Ion Implantation on Electrical and Optical Properties of Bulk-Barrier-Diodes.- 27. Influence of the Target Environment on Angular Distribution of Sputtered Particles.- 28. Simulation of Near Atomic Scale Sputter Induced Morphology.- 29. Epitaxy of Erbium on Tungsten.- 30. Growth of Thin Films by UHV Ion Beam Sputtering Deposition Technique.- 31. Microstructural Analysis of Electronically Conductive Ceramic Coatings Synthesized by Reactive Ion Plating and Sputter Deposition.