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Emerging Technologies for In Situ Processing

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Proceedings of the NATO Advanced Research Workshop, Cargèse, France, May 4-8, 19871. H. Ahmed In-Situ Processing Canbining MBE, Li... Weiterlesen
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Beschreibung

Proceedings of the NATO Advanced Research Workshop, Cargèse, France, May 4-8, 1987

1. H. Ahmed In-Situ Processing Canbining MBE, Lit:hJgraphy and Ion-Implantation 2. 1. Hayashi M::tivations and Early DenDnstrations for In-Situ Prcx::essings For III -V Semiconductor Devices 13 3. John J. Ritsko Laser Etchi. nJ and Microelectronic Applications 23 4. D. Bauerle, T. Szorenyi, G. Q. Zhang, K. Piglmayer, M. Eyett, R. Kullmer Laser-Induced O1emical Processing of Materials 33 5. E. L. Hu High Technology Manufacturing : Critical Issues for the Future 45 6. J. P. Harbison, P. F. Liao, D. M. Hwang, E. Kapon, M. C. Tamargo, G. E. Derkits Jr. and J. Levkoff U1 tra High Vacuum Processing : MBE 55 7. P. N. Favennec, H. L'Haridon, M. Salvi, L. Henry, A. Le Cerre, D. Lecrosnier, M. A. Di Forte Poisson, J. P. Duchemin Epitaxial Growth of III-V Materials on Implanted III-V Substrates 61 8. R. L. Jackson, T. T. Kodas, G. W. Tyndall, T. H. Baum and P. B. Canita Mechanisms of Laser-Induced Deposition fran the Gas Phase 71 9. D. Braichotte and H. Van Den Bergh Tline Resolved Measurements in the Thennally Assisted Photolytic Laser O1emical Vapor Deposition of Platinum 83 10. M. Rothschild and D. J. Ehrlich Excliner Laser Projection Patterning 93 11. P. H. Key, P. E. Dyer, R. D. GreenJugh Excliner Laser Patterning and Etchi. nJ of Metals 105 12. G. Steng1, H. Loschner, E. Hanme1, E. D. Wolf, J. J. Muray Ion Projection Lit:hJgraphy 113 13. J. E. Bouree and J.

Inhalt
1. In-Situ Processing Combining MBE, Lithography and Ion-Implantation.- 2. Motivations and Early Demonstrations for In-Situ Processings For III-V Semiconductor Devices.- 3. Laser Etching and Microelectronic Applications.- 4. Laser-Induced Chemical Processing of Materials.- 5. High Technology Manufacturing: Critical Issues for the Future.- 6. Ultra High Vacuum Processing: MBE.- 7. Epitaxial Growth of III-V Materials on Implanted III-V Substrates.- 8. Mechanisms of Laser-Induced Deposition from the Gas Phase.- 9. Time Resolved Measurements in the Thermally Assisted Photolytic Laser Chemical Vapor Deposition of Platinum.- 10. Excimer Laser Projection Patterning.- 11. Excimer Laser Patterning and Etching of Metals.- 12. Ion Projection Lithography.- 13. UV Light-Assisted Deposition of A1 on Si from TMA.- 14. E-Beam Induced Decomposition of Inorganic Solids.- 15. Electronic Connection Through Silicon Wafers.- 16. The Development and Use of Novel Precursors for Photolytic Deposition of Dielectric Films.- 17. Focused Ion Beam Induced Deposition.- 18. Laser-Induced Metal Deposition for Clear Defect Repair Work on X-Ray Masks.- 19. Confirmation of the Wavelength Dependence of Silicon Oxidation Induced By Visible Radiation.- 20. Focused Ion Beam Technology and Applications.- 21. Laser Direct Writing for Device Applications.- 22. Laser-Induced Photoetching of Semiconductors with Chlorine.- 23. Recent Advances in Photo-Epitaxy for Infrared Detector Fabrication.- 24. Synthesis and Characterization of Laser Driven Powders.- 25. Physical Properties of Laser Written Chromium Oxide Thin Films.- 26. UV Laser Induced Oxidation of Silicon in Solid and Liquid Phase Regime.- 27. Laser Assisted Plasma Etching of Silicon Dioxide.- 28. Nd: Yag Laser Processing for Circuit modification and Direct Writing of Silicon Conductors.- 29. Study of Excimer laser Enhanced Etching of Copper and Silicon With (SUB) Monolayer Coverages of Chlorine.- 30. Surface Chemical Probes and Their Application to the Study of In Situ Semicmductor Processing.

Produktinformationen

Titel: Emerging Technologies for In Situ Processing
Editor:
EAN: 9789401071307
ISBN: 9401071306
Format: Kartonierter Einband
Herausgeber: Springer Netherlands
Genre: Maschinenbau
Anzahl Seiten: 304
Gewicht: 464g
Größe: H235mm x B155mm x T16mm
Jahr: 2011
Auflage: Softcover reprint of the original 1st ed. 1988

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