A NATO Advanced Research Workshop on the "Mechanisms of Reactions of Organometallic Compounds with Surfaces" was held in St. Andrews, Scotland in June 1988. Many of the leading international researchers in this area were present at the workshop and all made oral presentations of their results. In addition, significant amounts of time were set aside for Round Table discussions, in which smaller groups considered the current status of mechanistic knowledge, identified areas of dispute or disagreement, and proposed experiments that need to be carried out to resolve such disputes so as to advance our understanding of this important research area. All the papers presented at the workshop are collected in this volume, together with summaries of the conclusions reached at the Round Table discussions. The workshop could not have taken place without financial support from NATO, and donations were also received from Associated Octel, Ltd., STC Ltd., and Epichem Ltd., for which the organisers are very grateful. The organisation of the meeting was greatly assisted by Mrs G. MacArthur and Mr L.R. Dunley of the Chemistry Department, St. Andrews University.

Inhalt

Metallisation and Related Reactions.- New Directions in LCVD Metallisation Introduction and Conclusion.- Photoinduced Organometallic Processes in Semiconductor Surface Technology.- U.V. Excimer Laser Induced Photochemistry of Gaseous Organometallics for Surface Modification.- Laser-Induced Photodissociation of Al2(CH3)6: Gas-phase and Adsorbed Layer Dissociation Mechanisms for Al Film Growth.- Photonucleation and Photodeposition of Al on Si from Flowing Trimethylaluminium in Hydrogen.- An in-situ Study of Chemical Vapour Deposition of Triisobutylaluminum on Si(100).- An in-situ Study of the U.V. Photochemistry of Adsorbed TiCl4, by FTIR Spectroscopy.- Model Studies of LCVD of Transition Metals on Silicon: Surface Processes.- Excimer Laser Assisted Deposition of Cr on B Films.- Reactions of Group V Metal Hydrides with Surfaces.- Techniques for Studying Silicon Deposition.- Some Considerations of the Kinetics and Thermodynamics of CVD Processes.- The Chemistry of Silicon Deposition from Hydride Decomposition.- The Spectroscopy of Crystal Growth Surface Intermediates on Silicon.- Growth of Semi-Conductors by Gas Phase Movpe.- Growth of Semi-Conductors by Thermal MOVPE Introduction and Conclusions.- Reactions in OMVPE Growth of GaAs Determined Using labelling experiments.- Chemical Boundary Layers (MOCVD): The Return of the Stagnant Layer.- Monitoring Chemical Reactions in Metal-Organic Chemical Vapour Deposition (MOCVD).- Surface Studies at Atmospheric Pressure and Under UHV Conditions During Growth of GaAs.- Gas Phase and Surface Effects in the Thermal Decomposition of AsH3 and PH3 Studies by CARS..- In Situ Raman Studies of AsH3, and TMG Thermal Decomposition in GaAs MOVPE Conditions.- Surface vs Gasphase Processes in the MOCVD of GaAs..- Multiphoton Ionisation/Mass Spectrometnc Study of OMCVD Mechanisms Under Single Gas-Surface Collision Conditions.- CVD of SiC and A1N Thin Films Using Designed Organometallic Precursors.- Anisotropic Growth of GaAs in MOVPE.- Selective and Nonplanar Metal Organic Vapour Phase Epitaxy.- Photochemical Movpe Growth of Compound Semi-Conductors.- and Conclusions.- Mechanisms of the Photochemical Growth of Cadmium Mercury Telluride.- Alternative Growth Techniques to Atmospheric Pressure Movpe.- and Conclusions.- The Role of Surface and Gas Phase Reactions in Atomic Layer Epitaxy.- Gas Source Molecular Beam Epitaxy.- Heteroepitaxy of InSb by Metal Organic Magnetron Sputtering.