Advanced Plasma Technology

A panel of internationally renowned scientists discuss the latest results in plasma technology. This volume has been compiled with both a didactic approach and an overview of the newest achievements for industrial applications. It is divided into two main sections. One is focused on fundamental technology, including plasma production and control, high-pressure discharges, modeling and simulation, diagnostics, dust control, and etching. The section on application technology covers polymer treatments, silicon solar cell, coating and spray, biomaterials, sterilization and waste treatment, plasma propulsion, plasma display panels, and anti-corrosion coatings. The result is an indispensable work for physicists, chemists and engineers involved in the field of plasma technology.

Auteur
Professor Riccardo d'Agostino is director of the Department of Chemistry at the University of Bari, Italy. His research is focused on low pressure plasma processes and diagnostics for the modification of materials. During is career, he authored 180 scientific papers and edited four books and three international proceedings. His memberships include the managing committee of Plasma Science Technique Division of IUVSTA and, as chairman, the IUPAC Committee on "Plasma Chemistry" (1989-1991). He served as co-editor of the journal Plasmas and Polymers (until 2003) and chaired numerous international conferences.

Professor Pietro Favia is Associate Professor of Chemistry and Chemistry of Materials at the Department of Chemistry, University of Bari, Italy. During his career he focused on low pressure plasma processes, plasma diagnostics and surface characterization techniques. He authored about 100 papers, acted as editor of two books and served in many organizing and scientific committees of renowned international conferences on Plasma Chemistry.

Professors Favia and d'Agostino are the two editors in chief of the journal Plasma Processes and Polymers (PPP).
The co-editors, Professors Farzaneh Arefi-Konsari, Yoshinobu Kawai, Noriyoshi Sato, Hideo Ikegami, are also experienced plasma researchers. They are responsible for sub-areas within the monograph, on which they have concentrated in their respective careers.

Texte du rabat
Plasma technology is a rapidly growing field of science and technology with a boom of industrial applications. Panel display technology, solar cell development as well as tissue engineering and prostheses are just a few examples of significance to physicists, chemists, biologists and engineers alike. Edited and compiled by scientists with a global reputation in plasma research, this monograph compiles contributions on the latest results in plasma technology.

From the Contents:
Basic Approaches to Plasma Production and Control
Plasma Sources and Reactor Configurations
Advanced Simulations for Industrial Plasma Applications
Modeling and Diagnostics of He Discharges for Treatment of
Polymers
Three-Dimensional Modeling of Thermal Plasmas for the Design
of Sources
Radiofrequency Plasma Sources for Semiconductor Processing
Advanced Plasma Diagnostics for Thin-Film Deposition
Plasma Processing of Polymers by a Low-Frequency Discharge
Fundamentals on Plasma Deposition of Fluorocarbon Films
Plasma CVD Processes for Thin Film Silicon Solar Cells
VHF Plasma Production for Solar Cells
Growth Control of Clusters in Reactive Plasmas
Micro- and Nanostructuring in Plasma Processes for Biomaterials
Chemical Immobilization of Biomolecules on Plasma-Modified
Substrates
In Vitro Methods to Assess the Biocompatibility of Plasma-Modified Surfaces
Cold Gas Plasma in Biology and Medicine
Mechanisms of Sterilization and Decontamination of Surfaces
Application of Atmospheric Pressure Glow Plasma
Hydrocarbon and Fluorocarbon Thin Film Deposition
Remark on Production of Atmospheric Pressure Non-thermal
Plasmas
Present Status and Future of Color Plasma Displays
Characteristics of PDP Plasmas
Recent Progress in Plasma Spray Processing
Electrohydraulic Discharge Direct Plasma Water Treatment
Processes
Development and Physics Issues of an Advanced Space Prop

Contenu

Preface XV

List of Contributors XVII

1 Basic Approaches to Plasma Production and Control 1
N. Sato

1.1 Plasma Production 2

1.1.1 Under Low Gas Pressure (10 torr) 6

1.2 Energy Control 7

1.2.1 Electron-Temperature Control 7

1.2.2 Ion-Energy Control 10

1.3 Dust Collection and Removal 11

References 15

2 Plasma Sources and Reactor Configurations 17
P. Colpo, T. Meziani, and F. Rossi

2.1 Introduction 17

2.2 Characteristics of ICP 18

2.2.1 Principle 18

2.2.2 Transformer Model 19

2.2.3 Technological Aspects 20

2.3 Sources and Reactor Configuration 23

2.3.1 Substrate Shape 23

2.4 Conclusions 31

References 32

3 Advanced Simulations for Industrial Plasma Applications 35
S.J. Kim, F. Iza, N. Babaeva, S.H. Lee, H.J. Lee, and J.K. Lee

3.1 Introduction 35

3.2 PIC Simulations 37

3.2.1 Capacitively Coupled O2/Ar Plasmas 37

3.2.2 Three-Dimensional (3D) Charge-up Simulation 42

3.3 Fluid Simulations 47

3.3.1 Capacitively Coupled Discharges 48

3.3.2 Large Area Plasma Source 49

3.4 Summary 51

References 52

4 Modeling and Diagnostics of He Discharges for Treatment of Polymers 55
E. Amanatides and D. Mataras

4.1 Introduction 55

4.2 Experimental 56

4.3 Model Description 57

4.4 Results and Discussion 60

4.4.1 Electrical Properties 61

4.4.2 Gas-Phase Chemistry 66

4.4.3 PlasmaSurface Interactions 71

4.5 Conclusions 72

References 73

5 Three-Dimensional Modeling of Thermal Plasmas (RF and Transferred Arc) for the Design of Sources and Industrial Processes 75
V. Colombo, E. Ghedini, A. Mentrelli, and T. Trombetti

5.1 Introduction 76

5.2 Inductively Coupled Plasma Torches 77

5.2.1 Modeling Approach 77

5.2.2 Selected Simulation Results 82

5.2.2.1 High-Definition Numerical Simulation of Industrial

5.3 DC Transferred Arc Plasma Torches 85

5.3.1 Modeling Approach 85

5.3.2 Selected Simulation Results 89

References 95

6 Radiofrequency Plasma Sources for Semiconductor Processing 99
F. F. Chen

6.1 Introduction 99

6.2 Capacitively Coupled Plasmas 99

6.2.1 Dual-Frequency CCPs 100

6.3 Inductively Coupled Plasmas 103

6.3.1 General Description 103

6.3.2 Anomalous Skin Depth 106

6.3.3 Magnetized ICPs 107

6.4 Helicon Wave Sources 109

6.4.1 General Description 109

6.4.2 Unusual Features 110

6.4.3 Extended Helicon Sources 114

References 114

7 Advanced Plasma Diagnostics for Thin-Film Deposition 117
R. Engeln, M.C.M. van de Sanden, W.M.M. Kessels, M. Creatore, and D.C. Schram

7.1 Introduction 117

7.2 Diagnostics Available to the (Plasma) Physicist 118

7.3 Optical Diagnostics 118

7.3.1 ThomsonRayleigh and Raman Scattering 118

7.3.2 Laser-Induced Fluorescence 121

7.3.3 Absorption Techniques 122

7.3.4 Surface Diagnostics 126

7.4 Applications 127

7.4.1 ThomsonRayleigh Scattering and Raman Scattering 127

7.4.2 Laser-Induced Fluorescence 128

7.4.3 Absorption Spectroscopy 130

7.4.4 Surface Diagnostics 133

References 134

8 Plasma Processing of Polymers by a Low-Frequency Discharge with Asymmetrical Configuration of Electrodes 137
F. Arefi-Khonsari and M. Tatoulian <p&gt...