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Chemical Etching Behaviour of a Polyimide

  • Couverture cartonnée
  • 28 Nombre de pages
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Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, Molecular Physics, Solid State Physics, grade: A, , ... Lire la suite
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Description

Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, Molecular Physics, Solid State Physics, grade: A, , language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton-H (4-4'-oxydiphenylene pyromellitimide). Kapton-H samples were subjected to etching in 4N NaOH at 400 °C and at 500 °C temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton-H specimen was done using 75 MeV/nucleon O+ ion beam of fluence 1.875 x a trillion ions/cm2. The specimen was exposed to etchant for a period of 150 minutes. The effect of etching was observed as half layer thickness removed. Thickness measurements were made at etching cycles of 15 minutes each. It was observed that temperature and the irradiation has their effect on etching behaviour of Kapton-H. Study showed that the temperature results in the increased average bulk etch rate. The average bulk etch rate was also observed to increase with the irradiation of the sample.

Informations sur le produit

Titre: Chemical Etching Behaviour of a Polyimide
Auteur:
Code EAN: 9783668084186
ISBN: 978-3-668-08418-6
Format: Couverture cartonnée
Editeur: GRIN Verlag
nombre de pages: 28
Poids: 55g
Taille: H1mm x B1mm x T148mm
Année: 2015
Auflage: 2. Aufl.