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Multivariable dynamic modeling and plasma-oriented advanced process control of nonlinear reactive sputtering

  • Kartonierter Einband
  • 340 Seiten
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This thesis investigates the nonlinear reactive sputter process in a novel way: both from the control-theoretical side and from th... Weiterlesen
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Beschreibung

This thesis investigates the nonlinear reactive sputter process in a novel way: both from the control-theoretical side and from the plasma-physical side. The plasma behavior is explicitly considered for the process modeling and for the design of the control system to establish steady-state plasma conditions. By use of one of the presented control systems an unstable operation point of the process can be stabilized, which enables high deposition speed and a stoichiometric thin film subject to steady-state plasma conditions. In this framework, the plasma state is either defined by the self-bias voltage or the electron density. The application of the Multipole Resonance Probe allows to control the electron density as a quantity that directly characterizes the plasma state.

Autorentext
Christian Woelfel is postdoctoral researcher at Ruhr University Bochum, Germany. In his work, he combines the fields of control engineering and plasma science to develop an advanced plasma-oriented control strategy for vacuum processes. His research interests are focused on the modeling and control of physical systems against the background of interdisciplinary research themes that include plasma-based processes, process instrumentation and control theory.

Produktinformationen

Titel: Multivariable dynamic modeling and plasma-oriented advanced process control of nonlinear reactive sputtering
Untertitel: PhD Thesis
Autor:
EAN: 9783753424842
ISBN: 978-3-7534-2484-2
Format: Kartonierter Einband
Hersteller: BoD Books on Demand
Herausgeber: Books On Demand
Genre: Elektrotechnik
Anzahl Seiten: 340
Gewicht: 494g
Größe: H210mm x B148mm x T20mm
Jahr: 2021
Untertitel: Deutsch